UVAT Technology Co., Ltd: PVD,CVD,Dry etching equipment,Vacuum Coating Service

UVAT Honored with the 9th National Industrial Innovation Award

UVAT has hit a new milestone, taking home the 9th Ministry of Economic Affairs' National Industrial Innovation Award in 2025.

Ti-Cu Seed layer In line Vacuum Sputtering Equipment

Won the 29th Taiwan Excellence Award

high-temperature degas intelligent system, low-temperature of PVD intelligent monitoring system, pre-clean system, particle suppression system, titanium copper sputtering technology and optimization of titanium copper process parameters.

Metal plasma equipment

Plasma dry etching、Etching material: Cu,Ti,Ta,Si,SiO2,Pd…(All kinds of metal)、Etching material:PP,PR,PMMA,ABF,Epoxy…(All kinds of polymeric substance)、substrate: Wafer,Si,Glass,PP,PMMA,Cu…(All kinds of substrate)

Vertical plasma etching equipment

Vertical Plasma Etch Equipment(Inline system)、Plasma Via Desmear、Dry Film Descum

UVAT has hit a new milestone, taking home the 9th Ministry of Economic Affairs' National Industrial Innovation Award in 2025.(2025/06/12)

Equipment

Founded in 2002, UVAT is a group of specialists with years of experience in vacuum technology that are constantly engaged themselves in the design and development of Physical Vapor Deposition (PVD) and key coating machines. We provide sputtering equipment and coating OEM service.

OEM

The combination of cutting-edge customization technology and experience in process service, UVAT is able to improve the capability in equipment design and manufacture that helps us provide tailor-made service to meet customers’ demands.

Customer Service

All-round customer service and satisfaction with customers’ specific needs are the largest goals of our service; our feature is to grow constantly with our customers.